Magnetron Sputtering Target System

Specification

LKDC- 700F 800F 900F 1000F 1200F
The system is equipped with a centralized control device a (Japanese PRO- face touch screen & mitsubishi PLC), a computerized automatic gear-shifting vacuum gauge, a three-flowcontroller, a side-installed heating tube, a PID temperature control device, two sets of side-installed sputtering targets, a contravariant magnetron power & a contravariant bias power. Featuring its simple operation & fine film, it is widely applied to plate various decorative film & complex film.

 

 

 

 
 
 
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